YongXin Liu
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Electron power absorption in CF4 capacitively coupled RF plasmas operated in the striation mode
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Date of Publication:2024-05-17

Journal:Plasma Sources Science and Technology

Volume:33

Issue:4

ISSN No.:0963-0252

Key Words:Absorption mechanisms; Boltzmann; Boltzmann term analyse; Capacitively coupled plasmas; Electric discharges; Electron power; Electron power absorption; Inductively coupled plasma; Particle-in-cell simulations; Plasma simulation; Power absorption; Term analysis; Voltage amplitude

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Gender:Male

Alma Mater:大连理工大学

Degree:Doctoral Degree

School/Department:物理学院

Discipline:Plasma physics

Business Address:大连理工大学三束材料改性教育部重点实验室3号楼201室

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Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

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