大连理工大学主页平台管理系统 YongXin Liu--yxliu-- Effect of a negative DC bias on a capacitively coupled Ar plasma operated at different radiofrequency voltages and gas pressures

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Effect of a negative DC bias on a capacitively coupled Ar plasma operated at different radiofrequency voltages and gas pressures

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Journal:PLASMA SCIENCE & TECHNOLOGY

Volume:26

Issue:5

ISSN No.:1009-0630

Key Words:DRIVEN; ELECTRON; ION ENERGY-DISTRIBUTIONS; REGIMES; RF DISCHARGE; TRANSITION

Pre One:The electrical asymmetry effect in electronegative CF4 capacitive RF plasmas operated in the striation mode

Next One:Electron power absorption in CF4 capacitively coupled RF plasmas operated in the striation mode

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Professor
Supervisor of Doctorate Candidates
Supervisor of Master's Candidates

Gender:Male

Alma Mater:大连理工大学

Degree:Doctoral Degree

School/Department:物理学院

Discipline:Plasma physics

Business Address:大连理工大学三束材料改性教育部重点实验室3号楼201室

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