Indexed by:期刊论文

Date of Publication:2013-11-01

Journal:JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Included Journals:SCIE、EI、Scopus

Volume:31

Issue:6

ISSN No.:0734-2101

Abstract:The electron density is measured in low-pressure dual-frequency (2/60 MHz) capacitively coupled oxygen discharges by utilizing a floating hairpin probe. The dependence of electron density at the discharge center on the high frequency (HF) power, low frequency (LF) power, and gas pressure are investigated in detail. A (1D) particle-in-cell/Monte Carlo method is developed to calculate the time-averaged electron density at the discharge center and the simulation results are compared with the experimental ones, and general agreements are achieved. With increasing HF power, the electron density linearly increases. The electron density exhibits different changes with the LF power at different HF powers. At low HF powers (e. g., 30W in our experiment), the electron density increases with increasing LF power while the electron density decreases with increasing LF power at relatively high HF powers (e. g., 120W in our experiment). With increasing gas pressure the electron density first increases rapidly to reach a maximum value and then decreases slowly due to the combined effect of the production process by the ionization and the loss processes including the surface and volume losses. (C) 2013 American Vacuum Society.