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论文类型：期刊论文

发表时间：2014-05-07

发表刊物：LAB ON A CHIP

收录刊物：SCIE、PubMed、Scopus

卷号：14

期号：9

页面范围：1614-1621

ISSN号：1473-0197

摘要：Nanofluidic devices with micro and nanostructures are becoming increasingly important for biological and chemical applications. However, the majority of the present fabrication methods suffer from a low pattern transfer quality during the simultaneous embossing of the microscale and nanoscale patterns into a thermoplastic polymer due to insufficient polymer flow. In this work, a novel hybrid patterning technique, integrating hot embossing and inverse ultraviolet (UV) photolithography, is developed to fabricate micro and nanochannels with a high replication precision of the SU-8 layer. The influence of embossing temperature and time on the replication precision was investigated. The effect of UV lithography parameters on the micro and nanochannel pattern was analyzed. To improve the SU-8 bonding strength, the influence of the O-2 plasma treatment parameters on the water contact angles of the exposed and unexposed SU-8 layer were studied. A complete SU-8 nanofluidic chip with 130 nm wide and 150 nm deep nanochannels was successfully fabricated with a replication precision of 99.5%. Compared with most of the current processing methods, this fabrication technique has great potential due to its low cost and high pattern transfer quality of the SU-8 micro and nanochannels.