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Paper Publications

[241]Zhang, Quan-Zhi, Zhao, Shu-Xia, Jiang, Wei, Wang, You-Nian, QZ (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Separate control between geometrical and electrical asymmetry effects in capacitively coupled p...[J],JOURNAL OF PHYSICS D-APPLIED PHYSICS,2012,45(30)
[242]Mei, X. X., Wang, Y. N., Fu, J. Q., Li, X. N., Sun, W. F., Dong, C., XX (reprint author), Dalian Univ Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China..Surface nanostructure of a directionally solidified Ni-based superalloy DZ4 induced by high int...[J],APPLIED SURFACE SCIENCE,2012,258(20):8061-8064
[243]Mei, X., Fu, J., Liu, Xu, Wang, Y., XX (reprint author), Dalian Univ Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Elect Beams, Dalian 116024, Peoples R China..The corrosion and oxidation resistance improvement of DZ4 Ni-based superalloy irradiated by high ...[J],Advanced Materials Research,2012,538-541:276-280
[244]Mei, X., Liu, Y., Ma, Wang, XX (reprint author), Dalian Univ Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Elect Beams, Dalian 116024, Peoples R China..Structure and performance of YSZ thermal barrier coatings irradiated by high intensity pulsed ion...[J],Advanced Materials Research,2012,538-541:2377-2381
[245]Gao, Fei, Li, Xue-Chun, Zhao, Shu-Xia, Wang, You-Nian, YN (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Spatial variation behaviors of argon inductively coupled plasma during discharge mode transitio...[J],CHINESE PHYSICS B,2012,21(7)
[246]Liu, Yong-Xin, Zhang, Quan-Zhi, Jiang, Wei, Lu, Wen-Qi, Wang, You-Nian, YX (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Experimental validation and simulation of collisionless bounce-resonance heating in capacitivel...[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2012,21(3)
[247]Zhao, Shu-Xia, Gao, Fei, Wang, You-Nian, Bogaerts, Annemie, SX (reprint author), Univ Antwerp, Dept Chem, Res Grp PLASMANT, Univ Pl 1, B-2610 Antwerp, Belgium..The effect of F-2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 ind...[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2012,21(2)
[248]Dai Zhongling, Yue Guang, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Simulations of Ion Behaviors in a Photoresist Trench During Plasma Etching Driven by a Radio-Fr...[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(3):240-244
[249]Jiang, Xiang-Zhan, Liu, Yong-Xin, Lu, Wen-Qi, Bi, Zhen-Hua, Gao, Fei, Wang, You-Nian, YN (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Influence of dual-frequency source powers on ion density and electron temperature in capacitive...[J],18th International Vacuum Congress (IVC)/International Conference on Nanoscience and Technology (ICNT)/14th International Conference on Surfaces Science (ICSS)/Vacuum and Surface Sciences Conference of Asia and Australia (VASSCAA),2012,86(7,SI):881-884
[250]Wang Yan, Liu Xiangmei, Song Yuanhong, Wang Younian, Song, YH (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..One-Dimensional Fluid Model of Pulse Modulated Radio-Frequency SiH4/N-2/O-2 Discharge[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(2):107-110

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