大连理工大学主页平台管理系统王友年--中文主页-- Simulation of ion behavior in a photoresist trench during metal etching driven by a radio-frequency source

王友年

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Simulation of ion behavior in a photoresist trench during metal etching driven by a radio-frequency source

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论文类型：会议论文

发表时间：2011-01-01

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