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论文类型：期刊论文

发表时间：2013-10-01

发表刊物：PLASMA SOURCES SCIENCE & TECHNOLOGY

收录刊物：SCIE、EI、Scopus

卷号：22

期号：5

ISSN号：0963-0252

摘要：In dual-frequency (DF) capacitively coupled plasma discharges, the effect of reactor geometry on the plasma density is investigated by means of a two-dimensional self-consistent fluid model combined with a power supply computation module. The results indicate that by enlarging the inter-electrode gap or by blocking the electrode with dielectric materials, the plasma density becomes more uniform along the radial direction due to the suppressed edge effect. Different approaches of the connections of the DF sources show that the distribution of plasma density is mostly confined within the blocked high-frequency (HF)-driven electrode region. Considering the asymmetry electrode shape effect, a higher plasma density could be obtained by connecting the HF source on a smaller electrode. When considering the two methods of source coupling, the DF sources applied individually on opposite electrodes may produce a higher density in comparison with the sources applied on the same electrode.