研究领域
- 左春彦.高飞,戴忠玲,王友年.高功率微波输出窗内侧击穿动力学的PIC/MCC模拟研究[J],物理学报,2018(22):340-350
- 左春彦.高飞,戴忠玲,王友年.高功率微波输出窗内侧击穿动力学的PIC/MCC 模拟研究[J],物理学报,2018,67(22):267-278
- 戴忠玲.王友年,董婉,宋远红.Effect of ion bombardment time on the profile of atomic layer etching[A],2018
- 董婉.王喜凤,宋远红,戴忠玲,王友年.Effect of plasma uniformity on etching profiles[A],2018
- 董婉.王友年,戴忠玲,宋远红.ALE of SiO2 by alternating CF4 plasma with energetic Ar+ plasma beams[A],2018
- Ma, Xiaoqin.Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Dai, Zhongling,Wang, Younian,Zhang, Saiqian.Study on atomic layer etching of Si in inductively coupled Ar/Cl-2 plasmas driven by tailored bias waveforms[J],PLASMA SCIENCE & TECHNOLOGY,2017,19(8,SI)