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个人信息Personal Information
教授
博士生导师
硕士生导师
性别：女
毕业院校：大连理工大学
学位：博士
所在单位：物理学院
电子邮箱：daizhl@dlut.edu.cn
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- [1]左春彦, 高飞, 戴忠玲, 王友年.高功率微波输出窗内侧击穿动力学的PIC/MCC模拟研究[J],物理学报,2018,22:340-350
- [2]左春彦, 高飞, 戴忠玲, 王友年.高功率微波输出窗内侧击穿动力学的PIC/MCC 模拟研究[J],物理学报,2018,67(22):267-278
- [3]戴忠玲, 董婉, 宋远红, 王友年.Effect of ion bombardment time on the profile of atomic layer etching[A],2018
- [4]董婉, 王喜凤, 宋远红, 戴忠玲, 王友年.Effect of plasma uniformity on etching profiles[A],2018
- [5]董婉, 戴忠玲, 宋远红, 王友年.ALE of SiO2 by alternating CF4 plasma with energetic Ar+ plasma beams[A],2018
- [6]Ma, Xiaoqin, Zhang, Saiqian, Dai, Zhongling, Wang, Younian, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Study on atomic layer etching of Si in inductively coupled Ar/Cl-2 plasmas driven by tailored b...[J],PLASMA SCIENCE & TECHNOLOGY,2017,19(8,SI)
- [7]张赛谦, 杨雪, 戴忠玲, 王友年.反应物输运与Ar/C4F8等离子体中SiO2刻蚀的精度控制[A],2017,1
- [8]王喜凤, 宋远红, 戴忠玲, 王友年.射频容性耦合SiH4/Ar放电中反转电场及电子能量分布的模拟[A],2017,1
- [9]戴忠玲, 王友年.Study on atomic layer etching of Si in inductively coupled Ar/Cl2 plasmas driven by tailored bias...[J],Plasma Sci. Technol.,2017,19(6):85502-85502
- [10]戴忠玲, 王友年.Numerical study of atomic layer precision control for SiO2 etching[A],2017
- [11]戴忠玲, 王友年.Accuracy control of SiO2 etching in inductively coupled CF4/Ar plasmas[A],2017
- [12]Sui Jiaxing, Zhang Saiqian, Liu Zeng, Yan Jun, Dai Zhongling, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..A Multi-Scale Study on Silicon-Oxide Etching Processes in C4F8/Ar Plasmas[J],PLASMA SCIENCE & TECHNOLOGY,2016,18(6):666-673
- [13]Wang Xifeng, Wang Younian, Dai Zhongling, Zhao Shuxia, Song Yuanhong, Song, YH (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Hybrid Simulation of Duty Cycle Influences on Pulse Modulated RF SiH4/Ar Discharge[J],PLASMA SCIENCE & TECHNOLOGY,2016,18(4):394-399
- [14]戴忠玲, 王友年.Simulation of atomic layer etching of Si in inductively coupled argon/chlorine plasmas with tailo...[A],2016,51-51
- [15]刘佳, 阎军, 戴忠玲, 宋亦旭.C4F8/AR混合气体刻蚀SiO2的多目标优化研究[A],2015,319-320
- [16]Liu Zeng, Wang Younian, He Caiqiang, Dai Zhongling, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Effects of Tailed Pulse-Bias on Ion Energy Distributions and Charging Effects on Insulating Sub...[J],PLASMA SCIENCE & TECHNOLOGY,2015,17(7):560-566
- [17]戴忠玲, 王友年.Atomic layer etching of SiO2 under Ar/C4F8 plasmas with pulsed bias[A],2015
- [18]戴忠玲, 王友年.脉冲调制射频放电余辉期直流电压对离子能量分布的调控[A],2015
- [19]You Zuowei, Dai Zhongling, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Simulation of Capacitively Coupled Dual-Frequency N-2, O-2, N-2/O-2 Discharges: Effects of Exte...[J],PLASMA SCIENCE & TECHNOLOGY,2014,16(4):335-343
- [20]Hao Meilan, Dai Zhongling, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Effects of Low-Frequency Source on a Dual-Frequency Capacitive Sheath near a Concave Electrode[J],PLASMA SCIENCE & TECHNOLOGY,2014,16(4):320-323