location: Current position: Home >> Scientific Research >> Paper Publications

等离子体技术沉积SiCN薄膜中O杂质的来源、化合状态及其对薄膜结构和性能的影响

Hits:

Indexed by:期刊论文

Date of Publication:2009-01-01

Journal:真空科学与技术

Volume:29

Issue:1

Page Number:26-30

Pre One:On the defect induced ferromagnetic ordering above romm-temperature in undoped and Mn doped ZnO thin films

Next One:Studies of diamond-like carbon (DLC) films deposited on stainless steel substrate with Si/SiC intermediate layers