Current position: Home >> Scientific Research >> Paper Publications

Structrual and Electrical Properties of Reactive Magnetron Sputtered Yttrium-doped HfO2 Films

Release Time:2019-03-13  Hits:

Indexed by: Journal Article

Date of Publication: 2018-01-01

Journal: Chinese Physics B

Volume: 27

Issue: 4

Page Number: 481031-481036

Prev One:Automatic emissive probe apparatus for accurate plasma and vacuum space potential measurements

Next One:Automatic emissive probe apparatus for efficient plasma potential measurements