Current position: Home >> Scientific Research >> Paper Publications

Structrual and Electrical Properties of Reactive Magnetron Sputtered Yttrium-doped HfO2 Films

Release Time:2023-02-09  Hits:

Date of Publication: 2022-10-08

Journal: Chinese Physics B

Institution: 物理学院

Volume: 27

Issue: 4

Page Number: 481031-481036

Prev One:Radial nanofretting behaviors of ultrathin carbon nitride film on silicon substrate

Next One:Room temperature ferromagnetism in pristine MgO thin films
Recommended Ph.D.Supervisor Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click:Times MOBILE Version
The Founding Time : ..
The Last Update Time : ..

Mobile phone sweep