location: Current position: Home >> Scientific Research >> Paper Publications

通过制备Ti/TiC和Si/SixNy过渡层在铜基体上沉积类金刚石膜的研究

Hits:

Date of Publication:2022-10-09

Journal:真空科学与技术学报

Affiliation of Author(s):化工学院

Issue:5

Page Number:397-403

ISSN No.:1672-7126

Abstract:Diamond-like carbon (DLC) films were grown on copper substrate coated with an intermediate layer by magnetron sputtering physical vapor deposition (MS-PVD) and by microwave electron cyclotron resonance (MW-ECR) plasma enhanced chemical vapor deposition (PECVD). Raman spectroscopy result indicates that the films show an amorphous structure and typical characteristics of DLC films. The morphology of DLC was characterized by atomic force microscopy (AFM) and the hardness and modulus were analyzed by nanoindentation. The difference of DLC films deposited on copper substrate with Ti/TiC and Si/SixNy intermediate layers was discussed.

Note:新增回溯数据

Pre One:Studies of diamond-like carbon (DLC) films deposited on stainless steel substrate with Si/SiC intermediate layers

Next One:医用TiNi合金表面等离子体沉积梯度DLC膜及抗腐蚀性能