等离子体源辅助磁控溅射法低温(200℃)制备多晶硅薄膜
Release Time:2024-10-17 Hits:
Date of Publication: 2022-10-06
Journal: 真空
Issue: 3
Page Number: 47-50
ISSN: 1002-0322
Note: 新增回溯数据
Release Time:2024-10-17 Hits:
Date of Publication: 2022-10-06
Journal: 真空
Issue: 3
Page Number: 47-50
ISSN: 1002-0322
Note: 新增回溯数据