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类金刚石磁盘保护膜的性能、应用与制备

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Date of Publication:2022-10-06

Journal:真空科学与技术学报

Issue:1

Page Number:41-46,49

ISSN No.:1672-7126

Note:新增回溯数据

Pre One:等离子体技术沉积SiCN薄膜中杂质O的来源、化合状态及其对薄膜结构和性能的影响

Next One:等离子体溅射沉积法制备Ag/TS-1催化剂及其丙烯气相环氧化性能研究
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