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等离子体技术沉积SiCN薄膜中O杂质的来源、化合状态及其对薄膜结构和性能的影响

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Date of Publication:2022-10-06

Journal:真空科学与技术

Affiliation of Author(s):物理学院

Volume:29

Issue:1

Page Number:26-30

Note:新增回溯数据

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