Release Time:2024-10-17  Hits:

Date of Publication: 2022-10-04

Journal: 功能材料

Issue: 11

Page Number: 1850-1852,1856

ISSN: 1001-9731

Abstract: SiO_2 multilayer composite insulating film for cutting measurement temperature sensor was prepared by means of advanced twinned microwave ECR plasma source enhanced radio frequency (RF) reaction non-balance magnetron sputtering technique. Preparation technology for the SiO_2 film was studied. Micro-morphology,depth and compositions of SiO_2 film was investigated by SEM, AFM, step profiler and XPS. The results showed that SiO_2 thin-film posess small depth and excellent insulating property (insulation resistance reached 9. 5Xl0~(12)Ω). Binding force between the SiO_2 thin-film and metal substrate was 15. 8 and 16. 7N. It may meet the demands of preparing the cutter measurement temperature sensor.

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