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Associate Professor Supervisor of Master's Candidates

Paper Publications

[11]刘升光, 牟宗信, 秦颖.利用X射线拍摄劳厄斑研究LiF单晶体的内部结构[J],大学物理实验,2013,26(26):1-3
[12]臧海蓉, 丁安邦, 林曲, 陈宝清, 牟宗信, Zang, H.(mzongxin@dlut.edu.cn).中频磁控溅射技术制备Co-Ni合金薄膜[J],真空科学与技术学报,2012,32(7):622-625
[13]牟宗信, 臧海蓉, 刘冰冰, 林曲, 丁安邦, 王春, 董闯, Mu, Z.(mzongxin@dlut.edu.cn).AZ31镁合金基材非平衡磁控溅射镀膜工艺研究[J],真空科学与技术学报,2012,32(1):6-10
[14]牟宗信.AZ31 镁合金基材非平衡磁控溅射镀膜工艺研究[J],真空科学与技术学报,2012,32(1):6-10
[15]牟宗信, 牟晓东, 王春, 贾莉, 董闯.直流电源耦合高功率脉冲非平衡磁控溅射电离特性[J],物理学报,2011,60(1):422-428
[16]牟宗信.中频孪生靶非平衡磁控溅射制备氮化硅薄膜及其性能(英文)[J],材料科学与工程学报,Vol. 29, No.3,2011, 311-326,2011,29(3):311-326
[17]牟宗信.Studies of the composition and properties of silicon nitride thin films deposited by mid-frequenc...[J],材料科学与工程学报,2011
[18]王春, 牟宗信, 刘冰冰, 臧海荣, 牟晓东.中频孪生靶非平衡磁控溅射制备氮化硅薄膜及其性能[J],材料科学与工程学报,2011,29(3):331
[19]牟宗信, 王春, 贾莉, 牟晓东, 藏海荣, 刘冰冰, 董闯, Mu, Z.-X., Key Laboratory of Materials Modification by Laser, Ion, Electron Beams, School of Physics, Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China.高功率脉冲非平衡磁控溅射放电特性和参数研究[J],核聚变与等离子体物理,2010,30(4):365-369
[20]牟晓东, 牟宗信, 王春, 臧海荣, 刘冰冰, 董闯, Mu, X., Key Laboratory of Materials Modification by Laser, Ion, Electron Beams, School of Physics, Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, China.高功率脉冲非平衡磁控溅射制备CrNx薄膜及其性能研究[J],核技术,2010,33(12):951-954

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