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Investigation on internal stress of SU-8 photoresist film

Release Time:2019-03-11  Hits:

Indexed by: Conference Paper

Date of Publication: 2013-07-01

Included Journals: EI

Volume: 613

Page Number: 251-258

Abstract: In this paper, substrate curvature method was adopted and a theory model based on Stoney's formula was built for obtaining the internal stress of SU-8 film. The effect of substrate diameter, film thickness and post-baked temperature on substrate curvature ratio was investigated by ANSYS simulation. The analytical result shows that post-baked temperature is the main effect factor on internal stress of SU-8 film. In addition, internal stresses of SU-8 at three different post-temperatures (55°C, 70°C and 85°C) are measured. The results show that the experimental results greatly agreed with simulation analytical results. It means the internal stress of SU-8 film can be accurately described by the theory model, which provides a basis for the quantitative analysis of the internal stress in SU-8 film. © (2014) Trans Tech Publications, Switzerland.

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