个人信息Personal Information
教授
博士生导师
硕士生导师
性别:男
毕业院校:大连理工大学
学位:博士
所在单位:材料科学与工程学院
办公地点:材料馆332
联系方式:15641188312
电子邮箱:htma@dlut.edu.cn
Plasma enhanced chemical vapor deposition of diamond coatings on Cu-W and Cu-WC composites
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论文类型:期刊论文
发表时间:2015-12-25
发表刊物:SURFACE & COATINGS TECHNOLOGY
收录刊物:SCIE、EI、Scopus
卷号:284
页面范围:133-138
ISSN号:0257-8972
关键字:Diamond coating; Chemical vapor deposition; Cu-W composite; Adhesion
摘要:In this study, two Cu-W (Cu30-W, Cu40-W) and one Cu50-WC composites (all in wt.%) were synthesized by powder metallurgy and used as substrates for diamond coating in a microwave plasma enhanced chemical vapor deposition reactor. Optical microscopy, scanning electron microscopy, Raman spectroscopy, X-ray diffraction, indentation test and synchrotron-based high resolution X-ray near edge absorption spectroscopy were used to investigate the morphology, composition, microstructures and adhesion of diamond films. The results show that the adhesion of diamond coatings formed on these Cu-W alloy substrates is much higher than on pure Cu substrate. The adhesion improvement is primarily attributed to the reduced mismatch in the thermal expansion coefficients, and the formation of WC phase on the sub-surface of the substrate that strengthens the coating-substrate interfacial bonding. (C) 2015 Elsevier B.V. All rights reserved.