个人信息Personal Information
教授
博士生导师
硕士生导师
性别:男
毕业院校:大连理工大学
学位:博士
所在单位:材料科学与工程学院
办公地点:材料馆332
联系方式:15641188312
电子邮箱:htma@dlut.edu.cn
Enhanced diamond deposition on Kovar alloy substrate with Al interlayer
点击次数:
论文类型:期刊论文
发表时间:2014-07-01
发表刊物:MATERIALS RESEARCH INNOVATIONS
收录刊物:SCIE、EI
卷号:18
页面范围:979-982
ISSN号:1432-8917
关键字:Diamond film; CVD; Kovar alloy; Interlayer; Adhesion
摘要:During chemical vapour deposition of diamond coatings on transition metal (Fe, Co, Ni) substrates, porous graphitic carbon preferentially forms on the substrate surfaces and it induces a spontaneous spallation of the diamond films. In this study, an Al surface barrier film of 80nm thick has been used on a Kovar alloy substrate to enhance the interfacial adhesion of diamond films. Characterisation of the top deposit, interlayer and the underlying substrate was performed by Raman spectroscopy, energy dispersive X-ray analysis, scanning electron microscopy, synchrotron NEXAFS, and X-ray diffraction. The Al interlayer has effectively inhibited the formation of intermediate graphitic carbon and markedly enhanced the adhesion of diamond films. Continuous and adherent diamond films were achieved on the alloy substrate. This investigation also indicates the importance of the continuity of the Al interlayer in maintaining an integrity of the adherent diamond films.