个人信息Personal Information
教授
博士生导师
硕士生导师
性别:男
毕业院校:大连理工大学
学位:博士
所在单位:材料科学与工程学院
办公地点:材料馆332
联系方式:15641188312
电子邮箱:htma@dlut.edu.cn
In situ study on growth behavior of interfacial bubbles and its effect on interfacial reaction during a soldering process
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论文类型:期刊论文
发表时间:2014-06-30
发表刊物:APPLIED SURFACE SCIENCE
收录刊物:SCIE、EI、Scopus
卷号:305
页面范围:133-138
ISSN号:0169-4332
关键字:Intermetallic compound; Interfacial reaction; Bubbles; Diffusion; Dissolution; Synchrotron radiation
摘要:The growth behavior of interfacial bubbles and the effect of bubbles on interfacial reaction during a soldering process were in situ studied by the synchrotron radiation real-time imaging technology. It was found that the bubbles at the solid/liquid interface were heterogeneous nucleation. The heterogeneous nucleation energy of bubbles at the interface was one-tenth of the homogeneity nucleation energy at 250 degrees C. At the interface, each bubble grew into spherical finally and its volume increased with the rise of temperature. Annexations between adjacent bubbles occurred, during which the bigger bubbles moved toward the smaller ones. The bubbles at the solid/liquid interface affected the dissolution behavior of Cu substrate greatly, i.e., the closer to the bubble bottom the less the Cu dissolution was, since the less the solder and the easier the saturation were. Moreover, the effect of bubbles on the growth behavior of interfacial intermetallic compound (IMC) was also discussed. (C) 2014 Elsevier B.V. All rights reserved.