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论文类型：期刊论文

发表时间：2012-05-15

发表刊物：MATERIALS CHEMISTRY AND PHYSICS

收录刊物：SCIE、EI

卷号：134

期号：1

页面范围：145-152

ISSN号：0254-0584

关键字：Diamond coating; Ti alloy; Chemical vapor deposition; Interfaces

摘要：Diamond coating on Ti-6Al-4V alloy was carried out using microwave plasma enhanced CVD with a super high CH4 concentration, and at a moderate deposition temperature close to 500 degrees C. The nucleation, growth, adhesion behaviors of the diamond coating and the interfacial structures were investigated using Raman, XRD, SEM/TEM, synchrotron radiation and indentation test. Nanocrystalline diamond coatings have been produced and the nucleation density, nucleation rate and adhesion strength of diamond coatings on Ti alloy substrate are significantly enhanced. An intermediate layer of TiC is formed between the diamond coating and the alloy substrate, while diamond coating debonding occurs both at the diamond-TiC interface and TiC-substrate interface. The simultaneous hydrogenation and carburization also cause complex micro-structural and microhardness changes on the alloy substrates. The low deposition temperature and extremely high methane concentration demonstrate beneficial to enhance coating adhesion strength and reduce substrate damage. (C) 2012 Elsevier B.V. All rights reserved.