Release Time:2024-12-06 Hits:
Date of Publication: 2022-10-03
Journal: MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Volume: 16
Issue: 5,SI
Page Number: 1303-1307
ISSN: 1369-8001
Prev One:Influence of high-pressure hydrogen treatment on structural and electrical properties of ZnO thin films
Next One:Improvement of crystal quality and UV transparence of dielectric Ga2O3 thin films via thermal annealing in N-2 atmosphere