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赵书霞
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Associate Professor Supervisor of Master's Candidates
Paper Publications
[51]Wang Xifeng, Song Yuanhong, Zhao Shuxia, Dai Zhongling, Wang Younian, Song, YH (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Hybrid Simulation of Duty Cycle Influences on Pulse Modulated RF SiH4/Ar Discharge[J],PLASMA SCIENCE & TECHNOLOGY,2016,18(4):394-399
[52]Xu Hui-Jing, Zhao Shu-Xia, Gao Fei, Zhang Yu-Ru, Li Xue-Chun, Wang You-Nian, Zhao, SX (reprint author), Dalian Univ Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Discontinuity of mode transition and hysteresis in hydrogen inductively coupled plasma via a fl...[J],CHINESE PHYSICS B,2015,24(11)
[53]Yang, Liang, Yan, Hui-Jie, Qi, Xiao-Hua, Zhao, Shu-Xia, Ren, Chun-Sheng, CS (reprint author), Dalian Univ Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Geometry Effects of SDBD Actuator on Atmospheric-Pressure Discharge Plasma Airflow Acceleration[J],IEEE TRANSACTIONS ON PLASMA SCIENCE,2015,43(10):3653-3661
[54]高飞, 赵书霞, 王亚萍, 王友年.射频感性耦合C4F8等离子体的离解和电离机制[A],2015,1-26
[55]Zhao, Shu-Xia, Gao, Fei, Wang, Ya-Ping, You-Nian, Bogaerts, Annemie, SX (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Engn, Dalian 116024, Peoples R China..Effects of feedstock availability on the negative ion behavior in a C4F8 inductively coupled pl...[J],JOURNAL OF APPLIED PHYSICS,2015,118(3)
[56]Zhao, Shu-Xia, Bogaerts, Annemie, Zhang, Yu-Ru, Gao, Fei, Wang, You-Nian, SX (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Engn, Dalian 116024, Peoples R China..Bulk plasma fragmentation in a C4F8 inductively coupled plasma: A hybrid modeling study[J],JOURNAL OF APPLIED PHYSICS,2015,117(24)
[57]Liu, Wei, Wen, De-Qi, Zhao, Shu-Xia, Gao, Fei, Wang, You-Nian, W (reprint author), Dalian Univ Technol, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Characterization of O-2/Ar inductively coupled plasma studied by using a Langmuir probe and glo...[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2015,24(2)
[58]Xu, Hui-Jing, Zhao, Shu-Xia, Zhang, Yu-Ru, Gao, Fei, Li, Xue-Chun, Wang, You-Nian, HJ (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China..Equivalent circuit effects on mode transitions in H-2 inductively coupled plasmas[J],PHYSICS OF PLASMAS,2015,22(4)
[59]赵书霞, 张钰如, 高飞, 李雪春, 王友年.Equivalent circuit effects on mode transitions in H2 inductively coupled plasmas[J],Physcis of Plasmas,2015,22(4):43508-43508
[60]赵书霞, 高飞, 王友年.Characterization of O2/Ar inductively coupled plasma studied by using a Langmuir probe and global...[J],Plasma Sources Sci. Technol.,2015,24(2):25035-25035
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