高尚
个人信息Personal Information
教授
博士生导师
硕士生导师
性别:男
毕业院校:大连理工大学
学位:博士
所在单位:机械工程学院
学科:机械制造及其自动化
办公地点:机械工程学院高性能制造研究所#5015室
联系方式:手机:15104088992
电子邮箱:gaoshang@dlut.edu.cn
扫描关注
Insight into Polishing Slurry and Material Removal Mechanism of Photoassisted Chemical Mechanical Polishing of YAG Crystals.
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发表刊物:Langmuir : the ACS journal of surfaces and colloids
卷号:39
期号:38
页面范围:13668-13677
ISSN号:0743-7463
上一条:Surface characteristics and material removal mechanisms during nanogrinding on C-face and Si-face of 4H-SiC crystals: Experimental and molecular dynamics insights
下一条:Atomistic understanding of rough surface on the interfacial friction behavior during the chemical mechanical polishing process of diamond