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面向半导体工艺的平面线圈感性耦合氩等离子体源的三维流体模拟研究

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Date of Publication:2024-11-15

Journal:物理学报

ISSN No.:1000-3290

Key Words:coil structure; Inductively coupled plasma; plasma uniformity; Three-dimensional fluid simulation

CN No.:11-1958/O4

Next One:Effects of external parameters on plasma characteristics and uniformity in a dual cylindrical inductively coupled plasma
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