点击次数：

论文类型： 期刊论文

发表时间： 2014-02-01

发表刊物： JOURNAL OF MATERIALS SCIENCE

收录刊物： SCIE、EI、Scopus

卷号： 49

期号： 4

页面范围： 1755-1763

ISSN号： 0022-2461

摘要： The diffusion behavior of Zn atoms and Cu-Ni cross-solder interaction in Cu/Sn-9Zn/Ni interconnects during liquid-solid electromigration were investigated under a current density of 5.0 x 10(3) A/cm(2) at 230 degrees C. Under the combined effect of chemical potential gradient and electron wind, Zn atoms with positive effective charge number would directionally diffuse toward the Cu interface under both flowing directions of electrons. When electrons flowed from Cu substrate to Ni substrate, EM significantly enhanced the diffusion of Cu atoms to the opposite Ni interface, resulting in the formation of interfacial Cu5Zn8; while no Ni atoms diffused to the opposite Cu interface. When electrons flowed from Ni substrate to Cu substrate, only a small amount of Cu atoms diffused to the opposite Ni interface, resulting in the formation of a thin interfacial (NiCu)(3)(SnZn)(4) (containing 3 wt% Cu); EM significantly accelerated the diffusion of Ni atoms to the Cu interface, resulting in the formation of a large amount of (NiCu)(3) (SnZn)(4) at the Cu interface. Even under downwind diffusion, no apparent consumption of Cu substrate was observed due to the formation of a thick and dense Cu5Zn8 layer at the Cu interface. It is more damaging with electrons flowing from Ni to Cu than that from Cu to Ni.