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论文类型：期刊论文

发表时间：2014-01-07

发表刊物：JOURNAL OF APPLIED PHYSICS

收录刊物：SCIE、EI、Scopus

卷号：115

期号：1

ISSN号：0021-8979

摘要：The electron density and ion energy distribution (IED) are investigated in low-pressure dual-frequency capacitively coupled Ar/CF4 (90%/10%) and Ar/O-2/CF4 (80%/10%/10%) plasmas. The relations between controllable parameters, such as high-frequency (HF) power, low-frequency (LF) power and gas pressure, and plasma parameters, such as electron density and IEDs, are studied in detail by utilizing a floating hairpin probe and an energy resolved quadrupole mass spectrometer, respectively. In our experiment, the electron density is mainly determined by the HF power and slightly influenced by the LF power. With increasing gas pressure, the electron density first goes up rapidly to a maximum value and then decreases at various HF and LF powers. The HF power also plays a considerable role in affecting the IEDs under certain conditions and the ion energy independently controlled by the LF source is discussed here. For clarity, some numerical results obtained from a two-dimensional fluid model are presented. (C) 2014 AIP Publishing LLC.