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    黄火林

    • 教授     博士生导师   硕士生导师
    • 性别:男
    • 毕业院校:厦门大学
    • 学位:博士
    • 所在单位:光电工程与仪器科学学院
    • 学科:测试计量技术及仪器. 光学工程. 微电子学与固体电子学
    • 办公地点:大连理工大学 研教楼 724室
    • 电子邮箱:hlhuang@dlut.edu.cn

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    Model Development for Threshold Voltage Stability Dependent on High Temperature Operations in Wide-Bandgap GaN-Based HEMT Power Devices

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    论文类型:期刊论文

    发表时间:2018-12-01

    发表刊物:MICROMACHINES

    收录刊物:SCIE、PubMed、Scopus

    卷号:9

    期号:12

    ISSN号:2072-666X

    关键字:threshold voltage (V-th) stability; gallium nitride (GaN); high electron mobility transistors (HEMTs); analytical model; high-temperature operation

    摘要:Temperature-dependent threshold voltage (V-th) stability is a significant issue in the practical application of semi-conductor power devices, especially when they are undergoing a repeated high-temperature operation condition. The V-th analytical model and its stability are dependent on high-temperature operations in wide-bandgap gallium nitride (GaN)-based high electron mobility transistor (HEMT) devices that were investigated in this work. The temperature effects on the physical parameterssuch as barrier height, conduction band, and polarization chargewere analysed to understand the mechanism of V-th stability. The V-th analytical model under high-temperature operation was then proposed and developed to study the measurement temperatures and repeated rounds dependent on V-th stability. The validity of the model was verified by comparing the theoretical calculation data with the experimental measurement and technology computer-aided design (TCAD) simulation results. This work provides an effective theoretical reference on the V-th stability of power devices in practical, high-temperature applications.