Unintentionally doped high resistivity GaN layers with an InGaN interlayer grown by MOCVD
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发表时间:2022-10-03
发表刊物:RSC Advances
卷号:6
期号:65
页面范围:60068-60073
ISSN号:2046-2069
点击次数:
发表时间:2022-10-03
发表刊物:RSC Advances
卷号:6
期号:65
页面范围:60068-60073
ISSN号:2046-2069