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发布时间：2020-04-09
论文类型：期刊论文
发表时间：2020-01-01
发表刊物：Applied Surface Science
卷号：513
页面范围：145837-145837
上一条：Study on Preparation and Properties of InN Films on Self-Supporting Diamond Substrates Under Different Nitrogen Flows
下一条：Synergistic passivation effects of nitrogen plasma and oxygen plasma on improving the interface quality and bias temperature instability of 4H-SiC MOS capacitors
