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发表时间：2022-10-09

发表刊物：物理学报

所属单位：物理学院

卷号：54

期号：3

页面范围：1378-1384

ISSN号：1000-3290

摘要：A conventional magnetron and a co-axial electro-solenoid were used to construct an unbalanced magnetron sputtering deposition system for investigating its properties. At 0.2Pa, argon gas discharging, a shielded planar ion-collecting electrode was taken to measure the saturation ion beam flux density at the different axial positions. The saturation ion flux reached about 9mA/cm(2). The magneto-hydrodynamics was applied to analyse the influences of the magnetic mirror effect on the discharge properties caused by the solenoid. As a result, the comparisons of the theoretical calculations with the experiments indicated that the model described correctly the plasma properties in the unbalanced magnetron sputtering system.

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