赵宁

Professor   Supervisor of Doctorate Candidates   Supervisor of Master's Candidates

Main positions:材料科学与工程学院副院长

Gender:Male

Alma Mater:Dalian University of Technology

Degree:Doctoral Degree

School/Department:School of Materials Science and Engineering

Discipline:Materials Science

Business Address:知远楼B515(新材料大楼)

E-Mail:zhaoning@dlut.edu.cn


Paper Publications

Interfacial reactions in Cu/Sn/Cu(Ni) systems during soldering under temperature gradient

Hits:

Indexed by:会议论文

Date of Publication:2015-08-11

Included Journals:EI、CPCI-S、Scopus

Page Number:1263-1266

Key Words:solder joint; thermomigration; inteifacial reaction; intermetallic Compound

Abstract:The diffusion behavior of Cu and Ni atoms undergoing liquid-solid thermomigration in Cu/Sn/Cu and Cu/Sn/Ni solder joints was investigated under the temperature gradients of 136.5 degrees C/cm and 154.0 degrees C/cm at 250 degrees C, respectively. Asymmetrical growth of the interfacial IMCs was observed in the Cu/Sn/Cu solder joints, i.e., the IMCs at the cold end were much thicker than those at the hot end. The Cu-Ni cross-solder interaction occurred in the Cu/Sn/Ni solder joints during retlow on hot plate. Cu and Ni atoms arrived to the opposite sides under the concentration gradients, resulting in the formation of (Cux, Ni1-x)(6) Sns IMCs at both interfaces. The interfacial rewaction was accelerated by the combined effect of Cu concentration gradient and thermomigration. While in Cu/Sn/Cu solder joints, the thermomigration process was weakened by Cu concentration gradient. As a result, the IMCs layers at both cold and hot ends in Cu/SnlNi solder joints were thicker than those in Cu/Sn/Cu solder joints after the same retlow time.

Pre One:Effect of Sn grain orientation on Cu diffusion in SnAgCu solder interconnect undergoing electromigration

Next One:热迁移对Cu/Sn/Cu焊点液-固界面Cu_6Sn_5生长动力学的影响

Profile

赵宁,工学博士,教授,博士生导师,现任材料科学与工程学院副院长。《Scientific Reports》期刊编委,IEEE会员、IEEE-EPS会员,中国电子学会(电子制造与封装技术分会)、中国材料研究学会、中国机械工程学会高级会员。

2003年本科毕业于东北大学材料物理专业,2008年博士毕业于大连理工大学材料学专业。2009年至2011年在中科院微电子研究所系统封装技术研究室从事博士后研究,2011年加入大连理工大学材料学院,同年评为副教授,2017年评为博士生导师,2018年评为教授。2016年至2017年在美国佐治亚理工学院做访问学者,合作学者为美国工程院院士、中国工程院外籍院士C.P. Wong教授。

主要从事电子封装微互连材料与技术的基础理论及应用研究,重点围绕微互连方法与成型机理,微焊点晶粒生长调控、组织演变、热迁移行为与可靠性测试分析,晶圆级互连技术,无铅焊料及BGA焊球设计开发与组织控制,以及低电阻率电镀铜膜/线等方面开展深入研究。

主持国家自然科学基金(4项)、省部级科研项目十余项,参与多项国家科技重大专项等项目。在Acta Mater.、J. Mater. Sci. Tech.、ACS Appl. Mater. Inter.、Mater. Des.、Appl. Phys. Lett.、Scripta Mater.、Appl. Surf. Sci.、J. Mater. Process. Tech.、J. Mater. Res. Tech.、Adv. Mater. Inter.、J. Alloy. Compd.、Sci. Rep.、Mater. Charact.、Intermetallics、Mater. Res. Bull.、J. Appl. Phys.、Mater. Lett.、Mater. Chem. Phys.、J. Mater. Res.、J. Electron. Mater.、物理学报、金属学报、中国有色金属学报(英文版)、稀有金属材料与工程、焊接学报等期刊上发表学术论文120余篇;在ECTC、ICEPT、CSTIC、EPTC等国际学术会议上发表EI论文60余篇,5次获得最佳论文奖;获中国发明专利授权27项。入选辽宁省“百千万人才工程”、大连市高层次人才计划。


指导学生:

在读硕士生11人,博士生6人。

已毕业博士生5、硕士生24人。