邹赫麟

个人信息Personal Information

教授

博士生导师

硕士生导师

性别:男

毕业院校:威尔大学

学位:博士

所在单位:机械工程学院

学科:微机电工程

办公地点:机械工程学院2号楼214-2

联系方式:办公电话:0411-84709754

电子邮箱:zouhl@dlut.edu.cn

扫描关注

论文成果

当前位置: 中文主页 >> 科学研究 >> 论文成果

A novel 2D silicon nano-mold fabrication technique for linear nanochannels over a 4 inch diameter substrate

点击次数:

论文类型:期刊论文

发表时间:2016-01-11

发表刊物:SCIENTIFIC REPORTS

收录刊物:SCIE、PubMed

卷号:6

页面范围:18921

ISSN号:2045-2322

摘要:A novel low-cost 2D silicon nano-mold fabrication technique was developed based on Cu inclined-deposition and Ar+ (argon ion) etching. With this technique, sub-100 nm 2D (two dimensional) nanochannels can be etched economically over the whole area of a 4 inch n-type <100> silicon wafer. The fabricating process consists of only 4 steps, UV (Ultraviolet) lithography, inclined Cu deposition, Ar+ sputter etching, and photoresist & Cu removing. During this nano-mold fabrication process, we investigated the influence of the deposition angle on the width of the nano-channels and the effect of Ar+ etching time on their depth. Post-etching measurements showed the accuracy of the nanochannels over the whole area: the variation in width is 10%, in depth it is 11%. However, post-etching measurements also showed the accuracy of the nanochannels between chips: the variation in width is 2%, in depth it is 5%. With this newly developed technology, low-cost and large scale 2D nano-molds can be fabricated, which allows commercial manufacturing of nano-components over large areas.