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论文类型：期刊论文

发表时间：2013-07-01

发表刊物：JOURNAL OF MICROMECHANICS AND MICROENGINEERING

收录刊物：SCIE、EI、Scopus

卷号：23

期号：7

ISSN号：0960-1317

摘要：A novel method for fabricating two-dimensional (2D) polymer nanochannels by combining the sidewall lithography technique with the hot embossing approach is presented in this paper. A layer of nano-thick Au film was first sputtered on the surface of the micro-sized photoresist mesas. Then, arrays of one-dimensional (1D) Au nano-sidewalls were formed by anisotropic sputter etching. By taking the 1D Au nano-sidewalls as a mask, the 2D silicon nano-mold was obtained by deep reactive ion etching. The patterns of the 2D nano-mold were replicated directly into a 1 mm thick polyethylene terephthalate substrate by using the hot embossing technique. Polymer nanochannel arrays with dimensions of about 100 nm in width, 100 nm in depth and 4 mm in length fabricated uniformly over a large area were obtained. The resolution of nano-mold patterns fabricated in our work is not limited by ultraviolet optical lithography but by the thickness of the Au film deposited onto the photoresist mesas. The proposed method provides a low-cost way to produce high-quality and high-throughput 2D polymer nanochannels.