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Professor Supervisor of Doctorate Candidates Supervisor of Master's Candidates

Paper Publications

[481]Guo, Dongming, Zhang, Min, Jin, Zhuji, Kang, Renke, M (reprint author), Dalian Univ Technol, Key Lab Minist Educ China Precis & Non Tradit Mac, Dalian 116024, Peoples R China..Effect of direct current and pulse plating on the EDM performance of copper-zirconium diboride ...[J],JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING,2007,14(5):464-468
[482]郭晓光, 郭东明, 康仁科, 金洙吉, Guo, X.(guoxg@dl.cn).原子量级条件下单晶硅磨削过程中的亚表面损伤[J],半导体学报,2007,28(9):1353-1358
[483]王续跃, 许卫星, 司马媛, 吴东江, 康仁科, 郭东明, Wang, X.-Y.(wbzzd@dlut.edu.cn).利用图像处理技术评价硅片表面清洗率[J],光学精密工程,2007,15(8):1263-1268
[484]Guo, Dongming, Liu, Jingyuan, Kang, Renke, Jin, Zhuji, DM (reprint author), Dalian Univ Technol, Minist Educ, Key Lab Precis & Nontradit Machining Technol, Dalian 116023, Peoples R China..A pad roughness model for the analysis of lubrication in the chemical mechanical polishing of a...[J],SEMICONDUCTOR SCIENCE AND TECHNOLOGY,2007,22(7):793-797
[485]霍凤伟, 金洙吉, 康仁科, 郭东明, 杨春, Huo, F.-W.(huofengwei@sohu.com).细粒度金刚石砂轮表面磨粒识别研究[J],大连理工大学学报,2007,47(3):358-362
[486]李庆忠, 郭东明, 康仁科.ULSI制造中铜CMP抛光液的技术分析[J],半导体技术,2007,32(5):382-386
[487]余祖元, 郭东明, 贾振元.微细电火花加工技术[J],中国科技论文在线,2007,2(3):214-220
[488]李庆忠, 金洙吉, 张然, 康仁科, 郭东明.分散剂对铜CMP材料去除率和表面粗糙度影响的实验研究[J],润滑与密封,2007,32(3):70-72,109
[489]Zhang Yinxia, Kang Renke, Guo Dongming, Jin Zhuji, Zhang, YX (reprint author), Dalian Univ Technol, Key Lab Precis & Non Tradit Maching Technol, Chinese Minist Educ, Dalian 116024, Peoples R China..Microstructure studies of the grinding damage in monocrystalline silicon wafers[J],RARE METALS,2007,26(1):13-18
[490]刘巍, 张永顺, 贾振元, 王福吉, 郭东明, Liu, W..GMF双层膜几何非线性变形模型及实验研究[J],大连理工大学学报,2007,47(1):34-38

total751 49/76

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