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王友年
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Professor Supervisor of Doctorate Candidates Supervisor of Master's Candidates
Paper Publications
[271]Dai, Zhong-Ling, Yue, Guang, Wang, You-Nian, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Study on mechanism of etching in low pressure radio-frequency plasmas[J],Joint Meeting of the 10th Asia-Pacific Conference on Plasma Science and Technology (APCPST 2010)/153rd Symposium on Plasma Science for Materials (SPSM 2010),2011,11(5):S121-S125
[272]Xu, Xiang, Feng, Jie, Liu, Xiang-Mei, Wang, You-Nian, YN (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Engn, 2 Ling Gong Rd, Dalian 116023, Liao Ning, Peoples R China..Study of the dust removal efficiency in capacitively coupled plasmas with annular electrodes[J],Joint Meeting of the 10th Asia-Pacific Conference on Plasma Science and Technology (APCPST 2010)/153rd Symposium on Plasma Science for Materials (SPSM 2010),2011,11(5):S131-S134
[273]姜巍, 王虹宇, 张权治, 毕振华, 王友年.iPM:一个用于低温等离子体研究的两维隐式PIC/MC模拟程序[A],2011,87-87
[274]赵占强, 戴忠玲, 王友年.射频等离子体刻蚀SiO2的数值研究[A],2011,163-163
[275]宋远红, 王友年, 徐翔.低气压射频及甚高频容性耦和等离子体源的发展趋势及相关物理问题[A],2011,7-7
[276]刘文耀, 徐勇, 杜永权, 朱爱民, 王友年.光谱法对双频容性耦合CF4/Ar等离子体诊断[A],2011,194-194
[277]赵占强, 戴忠玲, 王友年.射频等离子体刻蚀SiO_2的数值研究[A],2011,1
[278]高飞, 赵书霞, 王友年.射频感性耦合等离子体放电模式跳变及回滞的实验研究[A],2011,186-186
[279]毕振华, 徐翔, 张钰如, 王友年.CCP射频放电流体模型面向加工工艺的仿真应用[A],2011,161-161
[280]张权治, 侯璐景, 王友年.电负性容性耦合放电中的电非对称效应的研究[A],2011,210-210
total420 28/42
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