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Effects of Hf buffer layer at the Y-doped HfO2/Si interface on ferroelectric characteristics of Y-doped HfO(2 )films formed by reactive sputtering

Release Time:2023-02-09  Hits:

Date of Publication: 2022-10-02

Journal: CERAMICS INTERNATIONAL

Volume: 44

Issue: 11

Page Number: 12841-12846

ISSN: 0272-8842

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