Release Time:2023-02-09 Hits:
Date of Publication: 2022-10-02
Journal: JOURNAL OF PHYSICS CONDENSED MATTER
Volume: 22
Issue: 34
ISSN: 0953-8984
Prev One:Facing-target mid-frequency magnetron reactive sputtered hafnium oxide film: Morphology and electrical properties
Next One:Effects of Hf buffer layer at the Y-doped HfO2/Si interface on ferroelectric characteristics of Y-doped HfO(2 )films formed by reactive sputtering