Hits:
Date of Publication:2022-10-02
Journal:JOURNAL OF PHYSICS CONDENSED MATTER
Volume:22
Issue:34
ISSN No.:0953-8984
Pre One:Facing-target mid-frequency magnetron reactive sputtered hafnium oxide film: Morphology and electrical properties
Next One:Effects of Hf buffer layer at the Y-doped HfO2/Si interface on ferroelectric characteristics of Y-doped HfO(2 )films formed by reactive sputtering