Current position: Home >> Scientific Research >> Paper Publications

Facing-target mid-frequency magnetron reactive sputtered hafnium oxide film: Morphology and electrical properties

Release Time:2023-02-09  Hits:

Date of Publication: 2022-10-02

Journal: JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Volume: 68

Issue: 5

Page Number: 679-685

ISSN: 0374-4884

Prev One:Hydrogen plasma induced crystallization of Si thin films by remote inductively coupled plasma source assistant pulsed dc twin magnetron sputtering

Next One:Experimental evidence for ferromagnetism at room temperature in MgO thin films
Recommended Ph.D.Supervisor Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click:Times MOBILE Version
The Founding Time : ..
The Last Update Time : ..

Mobile phone sweep