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Improved inflection point method of emissive probe for accurate measurement of plasma potential

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Date of Publication:2022-10-03

Journal:JOURNAL OF VACUUM SCIENCE TECHNOLOGY A

Volume:34

Issue:6

ISSN No.:0734-2101

Pre One:Investigation of temperature-dependent ferroelectric properties of Y-doped HfO2 thin film prepared by medium-frequency reactive magnetron co-sputtering

Next One:Improvement of the Harmonic Technique of Probe for Measurements of Electron Temperature and Ion Density
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