location: Current position: Home >> Scientific Research >> Paper Publications

微波ECR等离子体源增强非平衡磁控溅射DLC膜的制备与表征

Hits:

Indexed by:期刊论文

Date of Publication:2022-06-30

Journal:功能材料

Issue:3

Page Number:304-305,307

ISSN No.:1001-9731

Abstract:The configuration and working principle of microwave electron cyclotron resonance (ECR) plasma source enhanced unbalance magnetron sputtering equipment was introduced, and the preparation process of diamond-like carbon (DLC) by this equipment was described. Raman spectra confirm the DLC characteristics of the prepared film. The surface rms (root mean square) roughness of the film measured with atomic force microscope is approximately 1.9 nm, thus the film surface is very smooth. The CERT microtribometer system is employed to obtain information about the scratch resistance, frictional properties and sliding wear resistance of the film. Average friction coefficient is as low as 0.175. The wear condition of DLC film and Si substrate examined by scanning electron microscopy was compared, and the results show that the deposited DLC film has good wear resistance properties. The results of scratch resistance test indicate that the critical load is about 40 mN.

Note:新增回溯数据

Pre One:微波ECR等离子体增强磁控溅射制备SiNx薄膜及其性能分析

Next One:微波ECR等离子体特性及其对DLC膜性能的影响