Current position: Home >> Scientific Research >> Patents

一种提高SiC MOSFET器件高、低温稳定性的钝化方法

Release Time:2019-10-10  Hits:

First Author: Dejun WANG

Disigner of the Invention: Qin Fuwen,杨超,孙雨浓

Application Number: CN201811163899.3

Authorization Date: 2018-10-03

Authorization Number: CN109103078A

Prev One:一种提高SiC MOSFET器件性能稳定性的制作方法

Next One:电子回旋共振微波等离子体增强金属有机化学汽相沉积外延系统与技术