Release Time:2019-03-11  Hits:

Indexed by: Conference Paper

Date of Publication: 2007-07-08

Included Journals: Scopus、CPCI-S、EI

Volume: 6722

Key Words: SU-8 photoresist; UV-lithography; Fresnel diffraction; dimensional tolerance; development model

Abstract: In this paper, the dimensional precision and tolerance of SU-8 photoresist micro structures are investigated quantitatively. An UV exposure improved model and a dimensional tolerance model based on Fresnel diffraction theory are established by considering the impact of the refractive index and absorption coefficient of SU-8 photoresist on dimensional precision of UV-photolithography. These models can be used to predict the dimension and tolerance of SU-8 photoresist microchannels, and the variation between the dimensional tolerance and the photolithographic parameters. The dimension and tolerance of SU-8 photoresist microstructure are simulated by MATLAB. Based on the UV exposure model, a simple development model was established by swelling theory, which can be used to predict the swelling trend of SU-8 photoresist during developing process. By this development model, the dimension change of SU-8 photoresist due to swelling in developing process has been researched quantitatively.