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The effect of F-2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma

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Date of Publication:2022-10-03

Journal:PLASMA SOURCES SCIENCE TECHNOLOGY

Affiliation of Author(s):物理学院

Volume:21

Issue:2

ISSN No.:0963-0252

Pre One:Investigation of the effect of metastable atoms on mode transition in argon inductive discharge via a hybrid model

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