Current position: Home >> Scientific Research >> Patents

一种基片均匀抛光装置及其工作方法

Release Time:2019-10-12  Hits:

First Author: zhuxianglong

Disigner of the Invention: 金洙吉,Harry,Shang GAO,李彧,Dong Zhigang,Renke Kang

Application Number: CN201811151004.4

Authorization Date: 2018-09-29

Authorization Number: CN109304664A

Prev One:一种用于蜂窝芯材料切削的超声振动系统

Next One:一种楔形基片研磨装置及其工作方法