Current position: Home >> Scientific Research >> Patents

一种用于碳化硅晶片粗抛的氧化铝CMP抛光液及其抛光方法

Release Time:2026-03-13  Hits:

First Author: Renke Kang

Disigner of the Invention: Shang GAO,Dong Zhigang

Institution: 机械工程学院

Prev One:一种晶圆减薄机的刚度测量装置及方法

Next One:一种激光晶体薄片超精密磨削面形控制方法
Recommended Ph.D.Supervisor Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click:Times MOBILE Version
The Founding Time : ..
The Last Update Time : ..

Browse on mobile