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Journal:PLASMA SOURCES SCIENCE & TECHNOLOGY
Volume:33
Issue:4
ISSN No.:0963-0252
Key Words:ANALYTIC MODEL; ARGON; DENSITY; ELECTRODES; ENERGY; LARGE-AREA; NONUNIFORMITIES; REACTORS
Pre One:Hybrid simulation of radio frequency biased inductively coupled Ar/O2/Cl2 plasmas
Next One:Role of gas composition in weakened nonlinear standing wave excitation and improved plasma radial uniformity in very-high-frequency asymmetric capacitive Ar/CF4 discharges