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Hybrid simulation of radio frequency biased inductively coupled Ar/O2/Cl2 plasmas

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Journal:ACTA PHYSICA SINICA

Volume:73

Issue:4

ISSN No.:1000-3290

Key Words:CHLORINE PLASMAS; DIAGNOSTICS; DYNAMICS; ELECTRON; ENERGY-DISTRIBUTION; ETCHING CHARACTERISTICS; MODEL; PROFILE EVOLUTION; SHEATH; SILICON

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