Hybrid simulation of radio frequency biased inductively coupled Ar/O2/Cl2 plasmas
Release Time:2024-06-24 Hits:
Journal: ACTA PHYSICA SINICA
Volume: 73
Issue: 4
ISSN: 1000-3290
Key Words: CHLORINE PLASMAS; DIAGNOSTICS; DYNAMICS; ELECTRON; ENERGY-DISTRIBUTION; ETCHING CHARACTERISTICS; MODEL; PROFILE EVOLUTION; SHEATH; SILICON
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